| 摘要 |
PURPOSE:To provide a photosensitive material composition capable of forming a pattern by lithography using short wavelength light and usable as an insulating material by incorporating a specified disilane derivative and a specified ladder polysiloxane. CONSTITUTION:The photosensitive insulating material composition to be used for pattern formation comprises the disilane derivative represented by general formula I and the ladder polysiloxane having repeating units in the molecule. The disilane derivative of formula I functions as a photoreactive dye, and at least 2 of R<1> - R<6> is, preferably, phenyl groups, and the molecular weight of the ladder polysiloxane is optional and not limited, and when it is high, sensitivity is elevated at the time of forming the pattern but solubility is lowered, consequently it is decided by considering both, and for example, the ones having a molecular weight of about 20,000 is favorably used. |
