| 摘要 |
PURPOSE:To measure with a high accuracy by so fixing an X-ray incident angle as to satisfy conditions for detecting all diffracted X-rays from the upper layer film of upper and lower layers of a predetermined alloy layer and not detecting diffracted X-ray from a base metal, and deciding X-ray diffraction characteristic. CONSTITUTION:A sample 4 is formed of base metal, an upper layer of alloy containing the metal as a main ingredient, and a lower layer of alloy containing one or more of the same metals as those of the upper layer. When the incident angle alpha of an X-ray from an X-ray source 1 is fixed to a specific angle by a goniometer 3 in a range limited by maximum and minimum adhering amounts of an upper layer film of a quantitative range, mass absorption coefficients of the upper and lower layer films to the wavelength of a diffracted X-ray, and the diffraction angle of the base metal, all the diffracted X-rays from the upper film are detected by a detector 5, and the diffracted X-ray from the metal is not detected. The composition, adhering amount of an object to be measured are quantitatively decided from the relationship between the X-ray diffraction characteristic obtained in advance from the X-ray diffraction characteristic of the upper film of the detected result and the composition, adhering amount of the upper film to enable accurate measuring. |
