发明名称 Integrated circuit interconnection.
摘要 <p>A conductive layer (e.g., 21) is formed beneath a runner (e.g., 23) in an integrated circuit. The conductive layer is also formed within vias (e.g., 17). The conductive layer (e.g., 21 ) preserves electrical connection should the runner (e.g., 23) separate due, perhaps, to electromigration or stress voiding. The conductive layer (e.g., 21 ) also provides protection against various failures or defects which may occur in the runner material (e.g., 23) within the vias (e.g., 17). <IMAGE></p>
申请公布号 EP0459690(A1) 申请公布日期 1991.12.04
申请号 EP19910304595 申请日期 1991.05.21
申请人 AMERICAN TELEPHONE AND TELEGRAPH COMPANY 发明人 CHITTIPEDDI, SAILESH;KELLY, MICHAEL JAMES
分类号 H01L21/28;H01L21/3205;H01L21/768;H01L23/52;H01L23/532 主分类号 H01L21/28
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