CLEANING METHOD FOR SEMICONDUCTOR SUBSTRATE,申请号JP19900073928-传众专利搜索

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发明名称	CLEANING METHOD FOR SEMICONDUCTOR SUBSTRATE
摘要
申请公布号	JPH03273629(A)	申请公布日期	1991.12.04
申请号	JP19900073928	申请日期	1990.03.23
申请人	KYUSHU ELECTRON METAL CO LTD;OSAKA TITANIUM CO LTD	发明人	HAYATA KAZUAKI
分类号	H01L21/304	主分类号	H01L21/304
代理机构		代理人
主权项
地址

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