| 摘要 |
PURPOSE:To manufacture a high quality shadow mask having a hole without hole unevenness or defects by using resin composite material, in which grains are included to give a thixotropy, for material of an etching resistant layer. CONSTITUTION:For material of an etching resistance layer 12 to be applied to and filled in recessed hole 10 formed in a first etching process, resin composite material in which grains are included to give a thixotropy is used. The resin composite material can be filled easily without gaps in the recessed hole 10 which is relatively large formed on the inner side of a relatively small aperture of a resist film 5 remaining at the entrance of the recessed hole 10 through the aperture. A high quality shadow mask having a hole without hole unevenness or defects can be manufactured. |
