REAKTIONSBARRIERE FUER EINE MEHRSCHICHTIGE STRUKTUR IN EINER INTEGRIERTEN SCHALTUNG.

摘要

A reaction barrier is formed at an interface region between two layers (12,14) of a multilayer composite integrated circuit by implating one or more active atomic species at energies effective to place the atomic species at or near the interface (16). A further step may include annealing the structure formed above to promote efficacy of the reaction barrier.