| 摘要 |
<p>A negative photosensitive composition comprising an alkali-soluble resin, a photo-acid-generating material and a crosslinking agent for the alkali-soluble resin, which acts under an acidic condition, wherein said photo-acid-generating material is at least one member selected from the group consisting of a C1-C8 paraffin hydrocarbon or C5-C7 cycloparaffin hydrocarbon substituted by at least two bromine or iodine atoms, an oxadiazole derivative of the following formula (I), a s-triazine derivative of the following formula (II), a sulfone compound of the following formula (III) and a carboxylic acid derivative of the following formula (IV): <CHEM> wherein R<1> is alkyl, alkenyl or an aromatic group, which may have a substituent, and each of X<1>, X<2> and X<3>, which are independent from one another, is hydrogen or halogen, provided that at least two of X<1>, X<2> and X<3> are halogens; <CHEM> wherein each of R<2>, R<3> and R<4>, which are independent from one another, is alkyl, aryl or alkenyl, which may have a substituent, provided that at least one of R<2>, R<3> and R<4> is di- or tri-bromo or di- or tri-iodomethyl; <CHEM> wherein R<5> is alkyl, cycloalkyl, alkenyl or an aromatic group, which may have a substituent, and each of X<4>, X<5> and X<6>, which are independent from one another, is hydrogen, bromine or alkyl which may have a substituent, provided that at least two of X<4>, X<5> and X<6> are bromine; R<6>-COO-R<7> (IV) wherein each of R<6> and R<7>, which are independent from each other, is alkyl, alkenyl or an aromatic group, which may have a substituent, provided that at least one of R<6> and R<7> is substituted by halogen, and R<6> and R<7> are substituted by a total of at least two halogens.</p> |
