| 摘要 |
A laser beam scanning system is used as a laser probing apparatus. The apparatus includes an acousto-optic modulator provided on an optical path for intensity-modulating a laser beam in accordance with an input signal, a beam intensity control device for measuring a beam intensity distribution of the laser beam incident on a wafer surface, for correcting the input signal to the modulator as a result of measurement, and for making uniform the laser beam illumination distribution over the wafer surface, and a device for measuring an electrical variation in that wafer pattern portion illuminated with the laser beam.
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