发明名称 Method for producing synthetic diamond thin film, the thin film and device using it.
摘要 <p>The present invention provides a method for producing a synthetic diamond thin film (2) which comprises decomposing with microwave a raw material gas containing at least one compound selected from the group consisting of carbon monoxide, carbon dioxide and a hydrocarbon and hydrogen or hydrogen and oxygen to produce a plasma and contacting the plasma with the surface of a substrate (1) held outside the area irradiated with the microwave to form a diamond thin film (2) on the substrate (1). The present invention further provides an apparatus for producing a synthetic diamond thin film and a synthetic diamond thin film and devices in which the synthetic diamond thin film is used. &lt;IMAGE&gt;</p>
申请公布号 EP0457076(A2) 申请公布日期 1991.11.21
申请号 EP19910106700 申请日期 1991.04.25
申请人 HITACHI, LTD. 发明人 MURANAKA, YASUSHI;YAMASHITA, HISAO;MIYADERA, HIROSHI
分类号 C30B25/02;C23C16/27;C30B29/04 主分类号 C30B25/02
代理机构 代理人
主权项
地址