发明名称 |
Method for producing synthetic diamond thin film, the thin film and device using it. |
摘要 |
<p>The present invention provides a method for producing a synthetic diamond thin film (2) which comprises decomposing with microwave a raw material gas containing at least one compound selected from the group consisting of carbon monoxide, carbon dioxide and a hydrocarbon and hydrogen or hydrogen and oxygen to produce a plasma and contacting the plasma with the surface of a substrate (1) held outside the area irradiated with the microwave to form a diamond thin film (2) on the substrate (1). The present invention further provides an apparatus for producing a synthetic diamond thin film and a synthetic diamond thin film and devices in which the synthetic diamond thin film is used. <IMAGE></p> |
申请公布号 |
EP0457076(A2) |
申请公布日期 |
1991.11.21 |
申请号 |
EP19910106700 |
申请日期 |
1991.04.25 |
申请人 |
HITACHI, LTD. |
发明人 |
MURANAKA, YASUSHI;YAMASHITA, HISAO;MIYADERA, HIROSHI |
分类号 |
C30B25/02;C23C16/27;C30B29/04 |
主分类号 |
C30B25/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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