发明名称 MANUFACTURE OF HIGH-TEMPERATURE SUPERCONDUCTING THIN FILM
摘要 PURPOSE:To obtain a thin film having excellent crystallinity and electrical characteristics orientated in a-axis in forming a film by vacuum deposition method by forming a film on an oxide superconductor orientated in a axis previously made. CONSTITUTION:At first, a thin film of oxide superconductor orientated in axis is grown. The oxide superconductor is preferably a thin film prepared by sputtering method. Then the thin film is used as a substrate and a thin film of oxide superconductor orientated in a-axis is grown on the substrate. A substrate temperature in the preparation is a temperature at which a thin film of oxide superconductor orientated in c-axis is formed. Since the substrate is the thin film of oxide superconductor orientated in a-axis even by forming the film at the substrate temperature, the prepared high-temperature superconducting thin film is orientated in a-axis and a high-quality thin film having excellent crystallinity and sufficient intake of oxygen is obtained.
申请公布号 JPH03261608(A) 申请公布日期 1991.11.21
申请号 JP19900058513 申请日期 1990.03.09
申请人 SUMITOMO ELECTRIC IND LTD 发明人 TANAKA SABURO;NAKANISHI SHUSUKE;ITOZAKI HIDEO
分类号 C01B13/14;C01G1/00;C01G3/00;C01G29/00;H01B12/06;H01B13/00;H01L39/24 主分类号 C01B13/14
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