发明名称 |
MANUFACTURE OF HIGH-TEMPERATURE SUPERCONDUCTING THIN FILM |
摘要 |
PURPOSE:To obtain a thin film having excellent crystallinity and electrical characteristics orientated in a-axis in forming a film by vacuum deposition method by forming a film on an oxide superconductor orientated in a axis previously made. CONSTITUTION:At first, a thin film of oxide superconductor orientated in axis is grown. The oxide superconductor is preferably a thin film prepared by sputtering method. Then the thin film is used as a substrate and a thin film of oxide superconductor orientated in a-axis is grown on the substrate. A substrate temperature in the preparation is a temperature at which a thin film of oxide superconductor orientated in c-axis is formed. Since the substrate is the thin film of oxide superconductor orientated in a-axis even by forming the film at the substrate temperature, the prepared high-temperature superconducting thin film is orientated in a-axis and a high-quality thin film having excellent crystallinity and sufficient intake of oxygen is obtained. |
申请公布号 |
JPH03261608(A) |
申请公布日期 |
1991.11.21 |
申请号 |
JP19900058513 |
申请日期 |
1990.03.09 |
申请人 |
SUMITOMO ELECTRIC IND LTD |
发明人 |
TANAKA SABURO;NAKANISHI SHUSUKE;ITOZAKI HIDEO |
分类号 |
C01B13/14;C01G1/00;C01G3/00;C01G29/00;H01B12/06;H01B13/00;H01L39/24 |
主分类号 |
C01B13/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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