| 摘要 |
PURPOSE:To make mass-treatment of samples possible, improve efficiency of analytical work, and secure analytical accuracy by arranging a multi-sample- mounting device to selectively position one of samples at an irradiation position of ion beam in a vacuum chamber. CONSTITUTION:A plurality of samples 6, a beam finder 12 and a Faraday cup 13 are mounted on a sample mounting plate 7 and arranged in a vacuum chamber 5 and their mounting positions, order, and the number of samples 6 are inputted in a programmable controller (PC) 15 and stored therein, and at the same time, the chamber 5 is evacuated. An operation start command is generated from PC 15 to a beam controller 14 to generate an ion beam B. The beam B is adjusted by the controller 14 and a motor driver 17 rotates a sample mounting board 7 according to the command of the PC 15 to position the Faraday cup 13 at the irradiation position of the beam B. The current value is measured by a current measuring device 19 and sent to the PC 15, and then, the current value is adjusted to a set value to continuously analyze the sample 6. |
