发明名称 MASK STRUCTURE BODY FOR RADIATION EXPOSURE
摘要 <p>PURPOSE:To prevent mask distortion by relieving contraction at the time of the hardening of adhesive agent in virtue of air voids, and obtain a highly precise mask pattern, by bonding and fixing a mask and a mask frame by using adhesive agent containing a lot of fine air voids. CONSTITUTION:When a mask 2 and a mask frame 1 are bonded, epoxy system adhesive agent 4 of two-liquid type into which air voids are compulsorily mixed when main agent and hardener are mixed is used. Circular adhesive agent 4 whose one point is about 1.5mm is spread at 16 points on a mask frame 1 so as to be equally divided. Before the air voids escape, the mask 2 is stuck on the frame 1, and the adhesive agent is hardened. In this case, the area per one point of the adhesive agent 4 out of 16 points is made smaller than or equal to 3mm<2>. Thereby the bonding area where the adhesive agent 4 acts is reduced to be about 1/20 in total, as compared with the case where the adhesive agent 4 is spread on the whole part of the bonding surface of the mask 2 and the frame 1. Although the action strength of the bonding surface is reduced by the amount of air voids, required bonding strength is sufficiently satisfied. Thereby the distortion of a mask pattern is prevented and a highly precise mask pattern can be obtained.</p>
申请公布号 JPH03259509(A) 申请公布日期 1991.11.19
申请号 JP19900056695 申请日期 1990.03.09
申请人 CANON INC 发明人 TERAJIMA SHIGERU
分类号 G03F1/22;G03F1/50;G03F1/60;G03F1/68;H01L21/027;H01L21/30 主分类号 G03F1/22
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