发明名称 Laser sputtering apparatus
摘要 A laser sputtering apparatus includes a vacuum chamber, a laser for radiating a laser beam, a vacuum sealing window arranged at the chamber for introducing the beam into the chamber, a film transporting device for transporting a film while the film is passing near the window and a substrate holder arranged opposite to the window with the film therebetween for holding a substrate. The film has high laser transmission and a surface over which material for a thin film to be formed on the substrate is deposited. The device transports the film while the surface of the film is opposed to the substrate. The laser beam sputters the material on the thin film onto the substrate.
申请公布号 US5065697(A) 申请公布日期 1991.11.19
申请号 US19900559270 申请日期 1990.07.27
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 YOSHIDA, YOSHIKAZU;TANAKA, KUNIO;NISHIKAWA, YUKIO
分类号 C23C14/34;C23C14/24;C23C14/28 主分类号 C23C14/34
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