| 摘要 |
<p>PURPOSE:To enable a specified etching pattern to be drawn with a required accuracy and thereby improve a throughput entirely by providing an exposure optical system of different type from the other and controlling such exposure optical systems using a single position control system. CONSTITUTION:When a variable aperture exposure optical system 34 is used, a photosensitive material is attached to a stage 32 which is controlled by a high-precision length measurement system represented by a laser interference system similar to a well known automatic high-accuracy photodrawing machine. Then an exposure system which forms an image using a variable aperture, an autofocus mechanism system and an axial position setting system are controlled by a control device in accordance with pattern data used for drawing a pattern and thus a pattern is drawn. On the other hand, when a laser exposure optical system 35 is used, a photosensitive material is attached to a stage 32 controlled by the high-accuracy length measurement system represented by the laser interference system similarly to the automatic high-speed photodrawing machine. Then the exposure system which forms an image by deflection of a laser beam, the autofocus mechanism and the movement system are controlled by the control device in accordance with pattern data to draw a pattern.</p> |
