发明名称 EXCIMER LASER BEAM MACHINING METHOD
摘要 PURPOSE:To completely remove the decomposition product components of the carbon sticking to an org. material by irradiating the org. material with an excimer laser beam to decompose away the org. material, then washing the org. material with a solvent having a nitrogenous 6-memhered cyclic structure. CONSTITUTION:The small holes 4 of a polyimide film substrate 1 are irradiated with the excimer laser beam consisting of KrF to decompose away the polyimide in the parts of the small holes 4. The substrate 1 is then washed with the solvent having the nitrogenous 6-membered cyclic structure, by which a good insulating property is imparted to all of 1st electrodes 2a, 2b, 2c, 2d and 2nd electrodes 3a, 3b, 3c, 3d. The solvent having the nitrogenous 6 membered cyclic structure is a compd. contg. a nitrogen atom in the 6-membered cyclic structure.
申请公布号 JPH03258475(A) 申请公布日期 1991.11.18
申请号 JP19900054860 申请日期 1990.03.08
申请人 OLYMPUS OPTICAL CO LTD 发明人 YAMAOKA TOSHIHIDE
分类号 B23K26/00;B23K26/40;H05K3/00 主分类号 B23K26/00
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