| 摘要 |
PURPOSE:To ensure a uniform polishing amount and polished surface in a radial direction of the back of a stamper and to minimize a polishing strain by providing a linear speed device to control a drive device so that the linear speed of a stamper under rotation is linearly increased and decreased according to the position in a radial direction of the stamper of a polishing head. CONSTITUTION:A polishing head 1 is reciprocatively moved in the radial direction of a stamper 2 on a rotary table 3 to polish the back of the stamper 2. In this case, a drive device 6 for the rotary table 3 is controlled by a linear speed device 7 so that the linear speed of the stamper 2 under rotation is linearly increased and decreased according to the position in a radial direction of the stamper 2 of the polishing head 1. This constitution ensures a uniform polishing amount and polished surface in a radial direction of the back of the stamper 2 and minimizes a polishing strain. |
