| 摘要 |
<p>PURPOSE:To allow the automatic focusing with a reduction projection exposing device by providing a reflecting film of light on a part where a pattern is not formed on the surface of a transparent substrate on which surface the photoresist pattern is formed, matching a focus thereon, parallel moving the focus to the part where the pattern is not formed and matching the focus thereto. CONSTITUTION:A chromium film 2 is formed by sputtering, etc., in the part where the pattern is not formed on the surface (the surface having a pattern printing part 3) of a quartz glass wafer on which surface the photoresist pattern is formed. A photoresist film 4 is formed on the quartz glass wafer 1 formed with the chromium film 2 and the focus detecting light 5 is cast to the chromium film 2 and the focus point 6 on the chromium film 2 is exactly focused by using the reduction projection exposing device. The focus point 6 is then parallel moved to the pattern printing part 3 of the quartz glass wafer 1 where the pattern is to be formed. This point is irradiated with the focus detecting light 5 and is again focused. The automatic focusing by the reduction stepper is executed in this way.</p> |
