| 摘要 |
<p>PURPOSE:To produce a photomask where the relative position of a pattern area to a photomask substrate is correct by providing a metallic chromium film having the specular surface in two or more positions on side faces of the photomask substrate. CONSTITUTION:Two positions on each of four side faces of a transparent substrate 1 made of quartz glass or the like are polished. A metallic chromium film 2 is formed on one principal plane of the transparent substrate 1 by sputtering or vapor-deposition. A metallic chromium film is formed on polished parts of side faces of the transparent substrate by sputtering or vapor-deposition to provide specular surface parts 3. The metallic film having the specular surface is formed in at least two positions on side faces in this manner, and these specular surfaces are used at the time of pattern drawing to perform position measurement in the laser interference system. Thus, the positional deviation and the error of the photomask substrate size are corrected when the photomask substrate is set to a holder, and the photomask where the relative position of the pattern area to the photomask substrate is correct is produced.</p> |
