| 摘要 |
PURPOSE:To clearly indicate numbering, and to conduct analysis of a semiconductor device, which is highly integrated and brought into a microscopic state, in a precise manner by a method wherein an exposing process, in which a numbering region is separately exposed, is added for every exposing process before or after a step exposing process to be performed using a stepper, and a developing operation is conducted simultaneously. CONSTITUTION:The exposing treatment of a numbering region is conducted by a separate process for every pattern-forming process. For example, in a prealignment process which is the pretreatment of a step exposing process to be conducted using a stepper, the numbering region is detected and a specific width is exposed after a prealignment which is conducted on the basis of an orientation flat line. The numbering region is exposed by shifting an exposing head 10 to the direction shown by the arrow in the diagram. A positive resist 4 is removed by the next developing treatment, and the coated film 3, having the above-mentioned resist as a protective film, is exposed. By removing the coated film 3 on the numbering region by the etching treatment with which the coated film is etched, an identification mark can be seen clearly. |
