Conductive layer prodn. in LCD mfr. - by electroless nickel plating of structured indium-tin oxide layer without accidental connections between lines or layers

摘要

An electrically conductive layer is produced on an insulating (esp. glass) substrate by applying a structured indium-tin oxide layer, sensitising the ITO layer surface with a Pd soln. and then electrolessly Ni plating. The Pd soln. is pref. a weakly acidic soln. of PdCl2, pref. in methanol. The Ni plating soln. may be a nickel chloride, nickel phosphite or a nickel-boron plating soln., pref. with pH 6-8. USE/ADVANTAGE - The process is used in the mfr. of LCDs. It allows prodn. of adherent low-ohmic layers on structured circuit line patterns without forming undesired connections between closely adjacent circuit lines or layer portions. It can be applied to already mfd. display cells without damage caused by heating, mechanical loads or chemical attack.