Photoresist stripper compositions comprising N-alkyl-2-pyrrolidone, 1,2-propanediol and tetraalkylammonium hydroxide. The photoresist strippers are useful at high stripping temperatures (105 DEG C-125 DEG C) to remove hard baked photoresist without damaging semiconductor substrates or metallurgy.
申请公布号
WO9117484(A1)
申请公布日期
1991.11.14
申请号
WO1990US05898
申请日期
1990.10.15
申请人
INTERNATIONAL BUSINESS MACHINES CORPORATION
发明人
DEAN, ALICIA;FITZSIMMONS, JOHN, A.;HAVAS, JANOS;MCCORMICK, BARRY, C.;SHAH, PROBODH, R.
