发明名称 THIN-FILM ELIMINATION METHOD
摘要 PURPOSE:To prevent smear of a thin-film surface due to thin-film fine particles which scatters when a beam is projected by forming a smear-preventing film on the thin film previously and then eliminating this smear-preventing film after machining by the beam. CONSTITUTION:A smear-preventing film 1 is formed on a surface of a thin film 2 previously, an energy beam 5 is projected onto this smear-preventing film 1 to allow a desired part of the smear-preventing film 1 and a thin film 2 to be eliminated, and then the smear-preventing film 1 on the thin film 2 which has not been eliminated is eliminated. Thus, the thin films which scattered due to pumping phenomenon etc., attach onto the smear-preventing film 1, and the thin films which attach onto the smear-preventing film 1 are eliminated along with the smear-preventing film 1 after irradiation with the energy beam 5. Thus preventing thin pieces of the thin film which scattered onto the surface of the thin film 2 from remaining, thus preventing the surface of the thin film 2 from being smeared and enabling the desired part of the thin film 2 to be eliminated.
申请公布号 JPH03254117(A) 申请公布日期 1991.11.13
申请号 JP19900051901 申请日期 1990.03.05
申请人 NIKON CORP 发明人 MOGI KIYOSHI
分类号 G03F7/38;G03F7/20;H01L21/027 主分类号 G03F7/38
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