| 摘要 |
24133-536 CHROMIUM PLATING BATH FOR PRODUCING NON-IRIDESCENT, ADHERENT, BRIGHT CHROMIUM DEPOSITS AT HIGH EFFICIENCIES AND SUBSTANTIALLY FREE OF CATHODIC LOW CURRENT DENSITY ETCHING A chromium plating bath and process for producing a non-iridescent, adherent, bright chromium deposit at high efficiencies and high temperatures under conditions such that the process is substantially free of cathodic low current density etching. The bath consists essentially of chromic acid and sulfate in predetermined concentrations, and an organic sulfonic acid or salts thereof, e.g. methyl, ethyl and propyl sulfonic acid, and methane and 1,2-ethane disulfonic acid wherein the sulphonic acid ratio of S to C is ? 1/3. The bath is substantially free of carboxylic acid, phosphonic acids, perfluoroloweralkyl sulfonic acids, and halides. |
