| 摘要 |
PURPOSE:To detect the change in gas concentration during removing process stably without deterioration with time even in a photoasher, etc., for removing organic matters under atmospheric pressure by a method wherein a gas cooling down means is provided in a piping connecting gas exhaust ports and gas detecting means. CONSTITUTION:During the removing process of a resist film, a wafer 2 coated with a resist is heated at 150 deg.C-300 deg.C and then ozone 2 is led into a processing chamber from gas leading-in ports 5 through a gap between the wafer 2 and a separator 4. Next, the ozone is turned into active exygen atoms by ultraviolet ray lamps 7 above the separator 4 while the resist is cracked into carbon dioxide (CO2) gas, water, etc., and exhausted to the processing chamber 1 to be led into an exhaust duct. Besides, the CO2 gas is also exhausted from gas exhaust ports 6 provided on the separator 4. On the other hand, the terminal of removing process can be detected by providing a filter 11, a gas cooling down system 13 and a gas detecting means 12 to arrest the fine particles such as organic matters contained in the exhaust gas halfway in the piping led from the exhaust ports 6. Through these procedures, the CO2 gas can be detected stably thereby enabling the reliability upon the terminal detection to be enhanced. |
