发明名称 |
Photolytic deposition of metal from solution onto a substrate |
摘要 |
Metal is photolytically deposited from solution onto a substrate in contact with the solution by irradiating with light a solution containing a solubilized metal and a tetraarylborate compound capable of promoting the photoreduction of the metal onto the substrate.
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申请公布号 |
US5063083(A) |
申请公布日期 |
1991.11.05 |
申请号 |
US19900533317 |
申请日期 |
1990.06.05 |
申请人 |
THE RESEARCH FOUNDATION OF THE STATE UNIVERSITY OF NEW YORK |
发明人 |
EISCH, JOHN J.;BOLESLAWSKI, MAREK P. |
分类号 |
C23C18/14 |
主分类号 |
C23C18/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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