| 摘要 |
PURPOSE:To obtain a high sensitivity resin without especially adding a sensitizer, by introducing a group having a sensitizing group by the medium of acid amide group to a photosensitive resin containing a cinnamic ester group as the side chain of the resin. CONSTITUTION:Cinnamoyloxyalkyl (meth)acrylate (a) and N-(p-nitrophenyl) or N-(4-nitro-1-naphthyl) or the like N-substituted (meth)acryloamide (b) is copolymerized in presence of a radical polymerization catalyst in an organic solyent or hydroxyalkyl (meth)acrylate (c) and said (b) is copolymerized. A self-sensitizing type photosensitive resin having cinnamic ester groups and nitrophenyl or nitronaphthyl groups are produced by esterification of this copolymer with cinnamoyl halogenide. In place of said (c), glycidyl (meth)acrylate may be used. |
