| 摘要 |
PURPOSE:To clean off the contaminant ceramics film deposited in the device without causing secondary pollution by using the mixture of a main gas consisting of sulfur fluoride, etc., and a reinforcing gas consisting of fluorine, etc. CONSTITUTION:The gas for cleaning off the contaminant is formed by the mixture of a main gas consisting of a fluorine-contg. carbon halide and/or sulfur fluoride and a reinforcing gas consisting of a halogen fluoride and/or fluorine. The ceramics contaminant generated in the device for forming a ceramics film on a material except that on the material is brought into contact with the gaseous mixture. Consequently, the contaminant in the device is removed, and the inside of the device is cleaned. |
