<p>A new polymer family is shown for use in high speed photoresists. A dry film photoresist includes a polymer binder prepared from t-butyl methacrylate/methylmethacrylate/acrylic acid/ethyl acrylate and a suitable initiator.</p>
申请公布号
EP0454335(A2)
申请公布日期
1991.10.30
申请号
EP19910303327
申请日期
1991.04.16
申请人
INTERNATIONAL BUSINESS MACHINES CORPORATION
发明人
ALLEN, ROBERT DAVID;WALLRAFF, GREGORY MICHAEL;SIMPSON, LOGAN LLOYD;HINSBERG, WILLIAM DINAN III
