发明名称
摘要 PURPOSE:To obtain an image forming material developable with water and giving an image with superior resistance to water, acid and solvent by emulsion- polymerizing a vinyl monomer having a photosensitive group with other monomers including a monomer having two or more polymerizable vinyl groups in the molecule. CONSTITUTION:When a vinyl monomer having a photosensitive group is emulsion-polymerized with other vinyl monomers, a monomer having >=2 polymerizable vinyl groups in the molecule is used by >=1wt% of the amount of other vinyl monomers. By blending the resulting resin emulsion composition, a photosensitive resin composition is obtd. Said vinyl monomer having a photosensitive group is a water insoluble liq. monomer such as the ester of carboxylic acid having an azido group with a vinyl monomer having a hydroxyl group or the adduct of an isocyanate compound having an azido group to a vinyl monomer having a hydroxyl group.
申请公布号 JPH0368377(B2) 申请公布日期 1991.10.28
申请号 JP19820199364 申请日期 1982.11.13
申请人 NIPPON PAINT CO LTD 发明人 YAMAOKA TSUGIO;SAKURAI KYOMI
分类号 C08L101/00;C08F12/00;C08L33/00;C08L33/02;G03F7/00;G03F7/012;G03F7/033;G03F7/038 主分类号 C08L101/00
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