发明名称 |
METHOD FOR PLEATING KNIT OR WOVEN SILK FABRIC |
摘要 |
PURPOSE:To readily enable pleating in a knit or woven silk fabric excellent in hand and crease resistance by irradiating the knit or woven silk fabric with a low-temperature plasma and then pleating the fabric or irradiating a pleated knit or woven silk fabric with the low-temperature plasma. CONSTITUTION:A knit or woven silk fabric composed of 100% silk yarn, degummed, dyed and finished after knitting or weaving is irradiated with a low-temperature plasma (the plasma gas is preferably oxygen gas under 5X10<-1>Torr partial pressure for about 1-5min irradiation time) to etch the material surface region within the range of several to thousands of Angstrom . The resultant fabric is then pleated (normally at 90-160 deg.C for about 20sec to 6min in the case of dry heat conditions in heat treatment) or a pleated knit or woven silk fabric is irradiated with the low-temperature plasma to readily carry out pleating. |
申请公布号 |
JPH03241065(A) |
申请公布日期 |
1991.10.28 |
申请号 |
JP19890022990 |
申请日期 |
1989.01.31 |
申请人 |
YOSHIMURA TOSHIO;KOBAYASHI HOSEI KK |
发明人 |
YOSHIMURA TOSHIO;NISHIKAWA AKIFUMI;EJIRI KEIICHI;SHIMIZU SHIN;SAKAI MASAO |
分类号 |
D06F71/00;D06B19/00;D06J1/12;D06M10/00;D06M101/00;D06M101/02;D06M101/10;D06M101/12 |
主分类号 |
D06F71/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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