发明名称 MASTER HOLOGRAM AND MICROPATTERN REPLICATION METHOD
摘要 A hologram is directly recorded in a sensitized metal substrate. The hologram may be an amplitude hologram, or may be treated to produce a phase relief hologram which may be stamped into a plastic material for reproduction, be archivally stored, or used as a master for electroforming a second durable surface relief hologram for use as an embossing master. A suitable material is prepared from a polished silver plate exposed to halogen vapors. After exposure, the plate is developed and fixed, and the surface is differentially etched to form a surface relief suitable for hologram embossing. Daguerreotype processes are modified to make surface amplitude holograms and phase holograms. By etching through a metal film a semiconductor mask is obtained. By depositing a silver film directly on a wafer, masks are made with very high feature definition.
申请公布号 US5059499(A) 申请公布日期 1991.10.22
申请号 US19880202579 申请日期 1988.06.03
申请人 TEITEL, MICHAEL 发明人 TEITEL, MICHAEL
分类号 G03C1/496;G03H1/02 主分类号 G03C1/496
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