发明名称 PATTERN DEFORMATION SYSTEM
摘要 PURPOSE:To make it possible to deform every part of a profile shape independently at high speed and with high image quality by storing out-line data with attribute data in memory, expanding/reducing a coordinate value at a control point using conversion parameters and converting the coordinate value at the control point using the conversion parameters and the attributes given to the control point of outline data. CONSTITUTION:A parameter setting device 1 sets linear width, size and single pen part-end shape, and outline data is previously stored in outline data memory 2 with attributes. An attribute interpretation device 3 interprets attribute data given to a control point for a pattern and an expansion/reduction device 4 converts a coordinate value of the control point of a profile line based on a parameters, that is, an expansion/reduction rate. In addition, if it is the linear width or a linear end part that is to be set by the parameter setting device 1, coordinate conversion device 5 converts each coordinate value at the control point of outline font based on the set parameters and the attribute data of outline data interpreted by the attribute interpretation device 3. Thus various different patterns such as those with the independently deformed parts of a profile shape of high image quality are obtained.
申请公布号 JPH03234559(A) 申请公布日期 1991.10.18
申请号 JP19900028219 申请日期 1990.02.09
申请人 FUJI XEROX CO LTD 发明人 ONOZAWA YUJI
分类号 B41J2/485;B41J5/44;G06T5/30;G09G5/24;G09G5/26 主分类号 B41J2/485
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