发明名称 |
Positive photoresist composition. |
摘要 |
<p>A positive photoresist composition is disclosed, comprising (a) from 50 to 99 parts by weight of a polyhydric phenol compound which is a condensation product between a mixed phenol comprising o-cresol and at least one of 2,5-dimethylphenol and 3,5-dimethylphenol at a molar ratio of from 95/5 to 5/95 and an aldehyde and (b) from 1 to 50 parts by weight of a quinone diazide compound. The composition is excellent in sensitivity, resolving power, heat resistance, and resistance to dry etching.</p> |
申请公布号 |
EP0451850(A1) |
申请公布日期 |
1991.10.16 |
申请号 |
EP19910105806 |
申请日期 |
1991.04.11 |
申请人 |
MITSUBISHI PETROCHEMICAL CO., LTD. |
发明人 |
NAKANO, YOSHITOMO, C/O MITSUBISHI PETROCHEM. CO.;KADA, MASUMI, C/O MITSUBISHI PETROCHEM. CO. |
分类号 |
H01L21/027;G03F7/023 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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