发明名称 Process for preparing epitaxial II-VI compound semiconductor
摘要 An improved process for the production of an epitaxial II-VI compound semiconductor containing sulfur as the VI element by molecular beam epitaxy employing a sulfur molecular beam and a II element molecular beam in which the sulfur molecular beam is provided from solid sulfur through a specific two-step heating.
申请公布号 US5057183(A) 申请公布日期 1991.10.15
申请号 US19890446114 申请日期 1989.12.05
申请人 SHARP KABUSHIKI KAISHA 发明人 TOMOMURA, YOSHITAKA;KITAGAWA, MASAHIKO
分类号 C30B23/08;C30B29/48;H01L21/203;H01L21/363;H01L29/22;H01L31/18;H01L33/00 主分类号 C30B23/08
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