发明名称 DRY CVD WASTE GAS TREATMENT DEVICE
摘要 <p>PURPOSE:To enable waste gas treatment efficiently using a small-sized device by utilizing cooling and accumulation phenomenon on the surfaces of a plurality of metal wire gauzes provided in a waste passage for waste gas. CONSTITUTION:A dry CVD waste gas treatment device 10 is cooled, whereby waste gas is admitted from a CVD device 21 via an inlet 11 of the device 10 into the device 10. The waste gas flows toward the outlet 12 of the device 10, while fine particles are deposited over metal gauzes 15 which are rotating. The deposited particles are caused to float through blowoff and suction mechanisms 14 provided on opposite sides of the gauzes 15 by means of a vacuum cleaner and discharged from a suction port. As a result, efficiency of collection of fine particles can be improved and energy saving can be achieved.</p>
申请公布号 JPH03229609(A) 申请公布日期 1991.10.11
申请号 JP19900020432 申请日期 1990.02.01
申请人 DAN SANGYO KK 发明人 ONO KAZUMASA
分类号 C30B35/00;B01D46/10;B01D46/12;C23C16/44;F27D17/00;H01L21/205;H01L21/31 主分类号 C30B35/00
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