发明名称 High-speed diode and method for producing the same.
摘要 In a semiconductor device a first diode having a pn junction and a second diode having a combination of a Schottky barrier and a pn junction in a current-passing direction are provided side by side in a direction perpendicular to the current-passing direction. When a forward current with a current density JF is passed into the second diodes, the relation <MATH> is established in a forward voltage VF range of 0.1 (V) to 0.3 (V). The first diode is constituted by first and second semiconductor regions (13, 15) forming a pn junction therebetween, the second being in ohmic contact with one main electrode (3), and having an impurity concentration higher than that of the first semiconductor region (13). The second diode is constituted by first and third semiconductor regions (13, 16) forming a pn junction therebetween, the third being in contact through a Schottky barrier with the one main electrode (3) and having an impurity concentration higher than the first semiconductor region (13). <IMAGE>
申请公布号 EP0450306(A1) 申请公布日期 1991.10.09
申请号 EP19910102925 申请日期 1991.02.27
申请人 HITACHI, LTD.;HITACHI HARAMACHI SEMI-CONDUCTOR LTD. 发明人 MORI, MUTSUHIRO;YASUDA, YASUMITI;SAKURAI, NAOKI;ARAKAWA, HIDETOSHI;OWADA, HIROSHI
分类号 H01L29/861;H01L21/329;H01L25/07;H01L27/04;H01L29/06;H01L29/47;H01L29/78;H01L29/868;H01L29/872;H02M7/48;H02M7/487;H03K17/0814 主分类号 H01L29/861
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