| 摘要 |
The invention relates to a liquid resin composition which can be polymerized by radiation and which contains (i) a difunctional monomeric or polymeric acrylate or methacrylate, (ii) a tri- or polyfunctional acrylate or methacrylate, (iii) at least one unsaturated monofunctional monomeric compound of the formula VI <CHEM> wherein R<5> denotes hydrogen or methyl and R<6> is a group of the formula VII <CHEM> R<7> being tetrahydrofurfuryl, cyclohexyl, 2-phenoxyethyl, benzyl, isobornyl, glycidyl, dicyclopentenyl, morpholinoethyl, dimethylaminoethyl, diethylaminoethyl or a C1-C20 linear or branched aliphatic residue, or - if R<5> is hydrogen R<6> denotes additionally pyrrolidinon-2-yl, imidazonyl, carbazolyl, anthracenyl, phenyl, C5-C8cycloalkyl, naphthenyl, 2-norbornyl, pyridyl, N-caprolactamyl or toluyl and (iv) a photo-polymerization initiator for (i), (ii) and/or (iii), characterized in that said initiator is selected from the group consisting of (a) anionic dye-iodonium ion compounds of the formula VIII <CHEM> where D<(-)> is an anionic dye and R<8> and R<9> are independently selected from the group consisting of aromatic nuclei such as phenyl or naphthyl and m is 1 or 2; (b) anionic dye-pyrrylium compounds of the formula IX <CHEM> where D<(-)> and m are as defined above, R<1><0> denotes phenyl and Y denotes O or S; (c) cationic dye-borate anion complexes of the formula X <CHEM> where D<(+)> is a cationic dye; and R<1><1>, R<1><2>, R<1><3> and R<1><4> are independently selected from the group consisting of alkyl, aryl, alkaryl, aralkyl, alkenyl, alkinyl, alycyclic and saturated or unsaturated heterocyclic groups; and (d) a dye-sensitized photopolymerizable composition comprising a photoreducible dye, a thiol and optionally a N,N-dialkylaniline. Such compositions are suitable in the stereolithographic process.
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