CONTROL OF ETCH RATE RATIO OF SIO2/PHOTORESIST FOR QUARTZ PLANARIZATION ETCH BACK PROCESS,申请号EP19850100406-传众专利搜索

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发明名称	CONTROL OF ETCH RATE RATIO OF SIO2/PHOTORESIST FOR QUARTZ PLANARIZATION ETCH BACK PROCESS
摘要
申请公布号	EP0151948(B1)	申请公布日期	1991.10.09
申请号	EP19850100406	申请日期	1985.01.17
申请人	INTERNATIONAL BUSINESS MACHINES CORPORATION	发明人	CHEN, LEE;MATHAD, GANGADHARA SWAMI
分类号	H01L21/302;H01L21/3065;H01L21/3105;H01L21/311	主分类号	H01L21/302
代理机构		代理人
主权项
地址

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