发明名称 QUANTIFICATION OF MULTILAYER FILM BY X-RAY ANALYSIS
摘要 PURPOSE:To measure the concns. of the respective elements in the respective layers of a multilayer film when the thicknesses of the respective layers of the multilayer film are known by temporarily setting the X-ray intensity ratio of respective elements due to actual measurement as the composition ratio thereof. CONSTITUTION:The concns. of the constituent elements of a multilayer film being a sample are supposed from the X-ray intensity ratio of the characteristic X-ray intensities of the constituent elements in respective layers emitted from the multilayer film sample whose thickness is known excited by the electron beam accelerated by certain proper accelerating voltage and the characteristic X-ray intensities emitted from a single standard sample of constituent elements excited by the same accelerated electron beam. Next, on the basis of the supposed concns. of the constituent elements, the X-ray intensity ratio due to calculation is calculated by the simulation of the locus of the sample incident electron. The concns. of the respective constituent elements are corrected so that the X-ray intensity ratio due to calculation becomes equal to that due to measurement. Subsequently, the corrected concns. of the multilayer elements are set as temporary concns. to perform the same simulation as the previous one and the same calculation is repeated to successively determine the concns. of the elements of the respective layers of the multilayer film approximately.
申请公布号 JPH03226664(A) 申请公布日期 1991.10.07
申请号 JP19900023433 申请日期 1990.01.31
申请人 SHIMADZU CORP 发明人 NAKAGAWA YUKA
分类号 G01N23/225;G01N9/24 主分类号 G01N23/225
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