| 摘要 |
<p>PURPOSE:To enable a cleanest air emitted from a filter at a ceiling to be supplied for improved cleanliness and for saving space by providing a machining device and a cassette stage of a storage stage directly below the ceiling. CONSTITUTION:A plurality of semiconductor wafer machining device groups 1 which are placed opposingly across a space 3 at a central part is placed on a stage 11 which is placed on a hurdle-shaped ceiling 7 and stage height H1 of a cassette for storing wafers 2 on a stage 1a of a device 1 exceeds a height of a human being. Also, in a ceiling 8 which is equipped with a filter for cleaning air, a clean air obtained by enabling dust to be filtered is sent out and is circulated through the hurdle-shaped floor 7, thus achieving cleaning and space-saving.</p> |
