发明名称 METHOD OF FORMING THIN FILM, APPARATUS FOR FORMING THIN FILM AND SENSOR
摘要 In the manufacture of a substrate with a hydrophobic film used for a reference electrode of an ion sensor or the like, a hydrophobic film is formed on a substrate (6) by irradiating a target (5) consisting of a hydrophobic compound with a neutral atom beam and thereby effecting spattering. The apparatus for effecting the spattering comprises a target base (12) disposed in a vacuum chamber, an atom beam gun (11) for irradiating a target on the target base with a neutral beam, a substrate base (13) and a shutter (14) for controlling the passage of spattered particles. A thin film that is manufactured is suitable for an ion sensor,such as an ISFET or the like or an enzyme sensor.
申请公布号 EP0390692(A3) 申请公布日期 1991.10.02
申请号 EP19900400864 申请日期 1990.03.29
申请人 TERUMO KABUSHIKI KAISHA;KATSUBE, TERUAKI 发明人 KATSUBE, TERUAKI;YAMAGUCHI, SHUICHIRO, C/O TERUMO KABUSHIKI KAISHA;UCHIDA, NAOTO, C/O TERUMO KABUSHIKI KAISHA;SHIMOMURA, TAKESHI, C/O TERUMO KABUSHIKI KAISHA
分类号 C23C14/12;C23C14/46;G01N27/414;(IPC1-7):C23C14/34;C23C14/54 主分类号 C23C14/12
代理机构 代理人
主权项
地址