发明名称 |
METHOD OF FORMING THIN FILM, APPARATUS FOR FORMING THIN FILM AND SENSOR |
摘要 |
In the manufacture of a substrate with a hydrophobic film used for a reference electrode of an ion sensor or the like, a hydrophobic film is formed on a substrate (6) by irradiating a target (5) consisting of a hydrophobic compound with a neutral atom beam and thereby effecting spattering. The apparatus for effecting the spattering comprises a target base (12) disposed in a vacuum chamber, an atom beam gun (11) for irradiating a target on the target base with a neutral beam, a substrate base (13) and a shutter (14) for controlling the passage of spattered particles. A thin film that is manufactured is suitable for an ion sensor,such as an ISFET or the like or an enzyme sensor. |
申请公布号 |
EP0390692(A3) |
申请公布日期 |
1991.10.02 |
申请号 |
EP19900400864 |
申请日期 |
1990.03.29 |
申请人 |
TERUMO KABUSHIKI KAISHA;KATSUBE, TERUAKI |
发明人 |
KATSUBE, TERUAKI;YAMAGUCHI, SHUICHIRO, C/O TERUMO KABUSHIKI KAISHA;UCHIDA, NAOTO, C/O TERUMO KABUSHIKI KAISHA;SHIMOMURA, TAKESHI, C/O TERUMO KABUSHIKI KAISHA |
分类号 |
C23C14/12;C23C14/46;G01N27/414;(IPC1-7):C23C14/34;C23C14/54 |
主分类号 |
C23C14/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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