| 摘要 |
<p>In a film exposure apparatus and method of exposure using the same which are disclosed herein, a plurality of frames arranged in a longitudinal direction of a belt-shaped film are exposed sequentially to light for transcript of an image onto each of the frames. The film exposure apparatus comprises an illumination system, a photomask disposed at a location to which light from the illumination system is applied, a photomask position adjusting mechanism, a projection lens for projecting an image of the photomask irradiated, and a film feed mechanism for step-feeding the film one frame by one frame. The belt-shaped film is provided with at least two or more film-side alignment marks on each frame, and the photomask is provided with a circuit pattern whose image is to be projected and transferred onto the film, and photomask-side alignment marks in correspondence to the film-side alignment marks. <IMAGE></p> |
