发明名称 Method of manufacturing color filter including exposing planarizing layer through openings in a medium layer
摘要 A color filter and manufacturing method thereof are provided which can improve the optical transmittance and diminish the dispersion phenomena due to the diffraction and reflectance of incident light. The color filter has at least two mutually different filtering characteristics respectively corresponding to the plural pixels placed in a matrix on the background substrate. The color filter includes a planarizing layer, a color filter pattern, a coloring layer and a protective layer. The method for manufacturing the color filter involves forming a planarizing layer, a color filter pattern, and a protective layer.
申请公布号 US5053298(A) 申请公布日期 1991.10.01
申请号 US19900491101 申请日期 1990.03.09
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 PARK, HAN-SU;LEE, HYEONG-SEOK;JEONG, DEOK-KI
分类号 G02B5/20;G03F7/00;G09F9/30;H01L27/148;H01L31/0216 主分类号 G02B5/20
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