| 摘要 |
PURPOSE:To obtain a photo mask with a minimum variability on a plane in simple structure by installing a substrate holding base whose thermal capacity is larger than that of a substrate in a chamber where a specified development temperature is maintained and spraying developer over to a resist, rotating said holding base. CONSTITUTION:An attempt is made to install a substrate holding base 300 into a chamber 1 wherein a specified development temperature is maintained. The substrate holding base 300 is deigned to provide a thermal capacity larger than that of a substrate 4 and a surface area larger than that of the substrate 4. A further attempt is made to rotate the substrate holding base 300 for a specified time so that the temperature of the substrate 4 may become identical to the temperature of development liquid within the chamber 1. A further attempt is made to spray developer 6 over a resist, rotating the substrate holding base 300. This construction makes it possible to equalize the temperature distribution of the resist during development and obtain a photo mask with a minimum variability in simple structure. |
