| 摘要 |
PURPOSE:To suppress curvature of a photomask and to enhance the accuracy of transfer of the pattern to a semiconductor substrate by using a fixing and holding mechanism fitted with elastic bodies for applying tension to the glass substrate of the photomask. CONSTITUTION:The glass substrate 1 of a photomask is held by a vacuum chuck 3 having an evacuation hole 4 and evacuation is carried out through the hole 4 to fix the substrate 1. Right and left elastic bodies 5 have been connected to the chuck 3 and the substrate 1 is indirectly brought under tension by the chuck 3 having the two elastic bodies 5. Curvature of the photomask can be suppressed. |
