发明名称 |
Process for forming metal deposited film containing aluminium as main component by use of alkyl aluminum hydride. |
摘要 |
A process for forming a metal film comprises the steps of arranging a substrate in a space for formation of the film, introducing an alkylaluminum hydride gas and hydrogen gas into the space and heating directly the substrate to form a metal film comprising aluminum as main component on the surface of the substrate. <IMAGE> <IMAGE>
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申请公布号 |
EP0448223(A2) |
申请公布日期 |
1991.09.25 |
申请号 |
EP19910301278 |
申请日期 |
1991.02.18 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
MATSUMOTO, SHIGEYUKI, C/O CANON KABUSHIKI KAISHA;IKEDA, OSAMU, C/O CANON KABUSHIKI KAISHA |
分类号 |
C23C16/20;C23C16/46;H01L21/28;H01L21/285;H01L21/3205;H01L21/768 |
主分类号 |
C23C16/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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