发明名称 |
PROCEDIMENTO PER RISCALDARE IN MODO SELETTIVO UN FILM SU UN SUBSTRATO. |
摘要 |
A method for selectively heating a film on a substrate. The film is provided with a different absorption characteristic for light than the absorption characteristic of the substrate. The specimen (combined film and substrate) is illuminated by light having a maximum intensity at a wavelength which will be substantially absorbed by the film and substantially not absorbed by the substrate. |
申请公布号 |
ITRM910186(A1) |
申请公布日期 |
1991.09.24 |
申请号 |
IT1991RM00186 |
申请日期 |
1991.03.21 |
申请人 |
PEAK SYSTEMS, INC. |
发明人 |
STULTZ TIMOTHY J. |
分类号 |
H01L;H01L21/00;H01L21/20;H01L21/26;H01L21/268;H01L21/336;H01L29/78;H01L29/786;H01L31/04 |
主分类号 |
H01L |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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