发明名称 PROCEDIMENTO PER RISCALDARE IN MODO SELETTIVO UN FILM SU UN SUBSTRATO.
摘要 A method for selectively heating a film on a substrate. The film is provided with a different absorption characteristic for light than the absorption characteristic of the substrate. The specimen (combined film and substrate) is illuminated by light having a maximum intensity at a wavelength which will be substantially absorbed by the film and substantially not absorbed by the substrate.
申请公布号 ITRM910186(A1) 申请公布日期 1991.09.24
申请号 IT1991RM00186 申请日期 1991.03.21
申请人 PEAK SYSTEMS, INC. 发明人 STULTZ TIMOTHY J.
分类号 H01L;H01L21/00;H01L21/20;H01L21/26;H01L21/268;H01L21/336;H01L29/78;H01L29/786;H01L31/04 主分类号 H01L
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