PHOTOSENSITIVE RESIN COMPOSITION

摘要

PURPOSE:To obtain the positive type photoresist compsn. having a high resolving power by incorporating a specific compd. and alkaline-soluble novolak resin into the photosensitive resin compsn. CONSTITUTION:The positive type photoresist compsn. which can form resist patterns of the sectional shape having a high aspect ratio in patterns of <=1mum line width is obtd. by using the photosensitive resin compsn. contg. the compd. expressed by general formula (A) and the alkaline-soluble novolak resin. The alkaline-soluble novolak resin is obtd. by subjecting 0.6 to 1.0mol aldehydes per 1mol phenols to addition condensation in the presence of an acidic catalyst. The using ratio of the photosensitive material and the alkaline-soluble novolak resin is 5 to 100pts.wt. photosensitive material per 100pts.wt. novolak resin. The residual film rate is extremely inferior if this using ratio is below 5pts.wt. and the degradation in the sensitivity and the solubility in solvents is resulted when the rate exceeds 100pts.wt.