| 摘要 |
<p>PURPOSE:To shorten the time required to produce a photomask and to reduce the cost of the photomask by coating an optically transparent substrate with a compd. causing fading reaction and color development reaction under light in a region from UV to IR so that a pattern can directly be written and vanished. CONSTITUTION:A pattern recording layer 1 is formed on a quartz sheet as a substrate 2 by spin coating with a spiropyrane compd. dispersed in polystyrene or direct vapor deposition of the spiropyrane compd. A drawn pattern 3 is written in the pattern recording layer 1 by a direct drawing method with He-Cd laser light. When the entire surface of the resulting photomask is irradiated with IR rays, the pattern 3 is vanished and the layer 1 is made transparent again. A pattern is written again in the layer 1 with He-Cd laser light. The time required to produce the photomask is shortened and the cost of the photomask is reduced.</p> |
