| 摘要 |
<p>PURPOSE:To easily transfer and store a wafer between semiconductor treatment apparatus without being exposed to the air and to eliminate that the surface of the wafer is contaminated with dust particles produced inside a vacuum apparatus by a method wherein a jig used to, at the inside of a load-lock chamber, open and shut a lid which airtightly closes a semiconductor-wafer taking-out and carrying-into port is installed at the load-lock chamber. CONSTITUTION:A semiconductor-wafer housing and transfer container 10 is structured in such a way that it can be attached to and detached from a load- lock chamber 2; a jig 8 is installed in such a way that a lid 11 of a semiconductor-wafer taking-out and carrying-into port of the semiconductor- wafer housing and transfer container 10 can be opened and shut at the inside of the load-lock chamber 2. Consequently, a wafer can be transferred between treatment apparatus in a vacuum or in an inert-gas atmosphere. Thereby, it is possible to eliminate that the surface of the wafer is contaminated with dust particles produced inside a vacuum treatment apparatus and that the wafer is contaminated when it is transferred or stored in the air.</p> |
